Publication Information

Title: Atomic Layer Deposition and Electrical Properties of SrTiO3 Thin Films Grown Using Sr(C11H19O2)2, Ti(Oi-C3H7)4, and H2O

Type: Journal

Info: Journal of The Electrochemical Society, 154 (6) G127-G133 (2007)

Date: 2007-01-29

DOI: http://dx.doi.org/10.1149/1.2720763

Author Information

Name

Institution

Seoul National University

Seoul National University

Seoul National University

Seoul National University

Films

Plasma SrTiO3 using Quros 100

Deposition Temperature Range = 190-270C

36830-74-7

546-68-9

7732-18-5

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Thickness

Ellipsometry

Unknown

Chemical Composition, Impurities

XRF, X-Ray Fluorescence

Spectrace QuanX

Compositional Depth Profiling

AES, Auger Electron Spectroscopy

Perkin Elmer 660

Compositional Depth Profiling

SIMS, Secondary Ion Mass Spectrometry

CAMECA IMS 6F

Chemical Binding

XPS, X-ray Photoelectron Spectroscopy

Kratos Axis

Capacitance

C-V, Capacitance-Voltage Measurements

HP 4194A

Dielectric Constant, Permittivity

C-V, Capacitance-Voltage Measurements

HP 4194A

EOT, Equivalent Oxide Thickness

C-V, Capacitance-Voltage Measurements

HP 4194A

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

XRD, X-Ray Diffraction

Unknown

Leakage Current

I-V, Current-Voltage Measurements

HP 4140

Substrates

Si with native oxide

Ru

Keywords

Notes

1185



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