The publication database currently has 1556 entries.
Search from:
191 Films Compositions
401 Precursors and Plasma Gases
75 Deposition Hardwares
241 Film and Plasma Characteristics
83 Theses
Use Multifactor Search for more complex searches and for searching by other criteria (author, affiliation, analysis, deposition temperature)
ALD Links
Contact Us
Advertising
Recent Database Additions
Plasma-enhanced atomic layer deposition of gallium nitride thin films on fluorine-doped tin oxide glass substrate for future photovoltaic application
Plasma enhanced atomic layer deposition of thin film Li1+xMn2-xO4 for realization of all solid-state 3D lithium-ion microbatteries
AlN PEALD with TMA and forming gas: study of plasma reaction mechanisms
Search 1556 plasma ALD publications by:
Search 1556 plasma ALD publications by:
Study on the resistive switching time of TiO2 thin films
Type:
Journal
Info:
Applied Physics Letters 89, 012906 (2006)
Date:
2006-05-19
Author Information
| Name | Institution |
|---|---|
| Byung Joon Choi | Seoul National University |
| Seol Choi | Seoul National University |
| Kyung Min Kim | Seoul National University |
| Yong Cheol Shin | Seoul National University |
| Cheol Seong Hwang | Seoul National University |
| Sung-Yeon Hwang | Hynix Semiconductor |
| Sung-Sil Cho | Hynix Semiconductor |
| Sanghyun Park | Hynix Semiconductor |
| Suk Kyoung Hong | Hynix Semiconductor |
Films
Film/Plasma Properties
Characteristic: Resistive Switching
Analysis: Custom
Substrates
Keywords
| Resistance RAM |
| Resistive Switch |
Notes
| 1474 |
Popular Precursors
Top Authors
| Erwin (W.M.M.) Kessels |
| Hyeongtag Jeon |
| Hyungjun Kim |
| Mauritius C. M. (Richard) van de Sanden |
| Christophe Detavernier |