Publication Information

Title: Chemically conformal deposition of SrTiO3 thin films by Atomic Layer Deposition using conventional metal organic precursors and remote-plasma activated H2O

Type: Journal

Info: Microelectronic Engineering 80 (2005) 158 - 161

Date: 2005-06-04

DOI: https://doi.org/10.1016/j.mee.2005.04.060

Author Information

Name

Institution

Seoul National University

Seoul National University

Seoul National University

Films

Plasma SrO using Custom

Deposition Temperature = 250C

36830-74-7

7732-18-5

Plasma TiO2 using Custom

Deposition Temperature = 250C

546-68-9

7732-18-5

Plasma SrTiO3 using Custom

Deposition Temperature = 250C

36830-74-7

546-68-9

7732-18-5

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Thickness

Ellipsometry

-

Chemical Composition, Impurities

XRF, X-Ray Fluorescence

-

Conformality, Step Coverage

TEM, Transmission Electron Microscope

-

EOT, Equivalent Oxide Thickness

C-V, Capacitance-Voltage Measurements

HP 4194A

Leakage Current

I-V, Current-Voltage Measurements

HP 4140

Substrates

SiO2

Ru

Keywords

Notes

1243



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