
Plasma enhanced atomic layer deposition of SrTiO3 thin films with Sr(tmhd)2 and Ti(i-OPr)4
Type:
Journal
Info:
J. Vac. Sci. Technol. A 20(5), Sep/Oct 2002
Date:
2002-06-17
Author Information
Name | Institution |
---|---|
J. H. Lee | Samsung Electronics Co. |
Young Joon Cho | Samsung Electronics Co. |
Y. S. Min | Samsung Electronics Co. |
D. Kim | Samsung Electronics Co. |
Shi-Woo Rhee | Pohang University of Science and Technology (POSTECH) |
Films
Film/Plasma Properties
Characteristic: Chemical Composition, Impurities
Analysis: SIMS, Secondary Ion Mass Spectrometry
Characteristic: Conformality, Step Coverage
Analysis: SEM, Scanning Electron Microscopy
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: -
Characteristic: EOT, Equivalent Oxide Thickness
Analysis: -
Characteristic: Leakage Current
Analysis: -
Substrates
Ru |
Notes
Precursors dissolved in THF. |
Cycle was Sr and Ti pulsed together/Ar purge/O2 plasma/Ar purge. |
125 |