Publication Information

Title: Plasma enhanced atomic layer deposition of SrTiO3 thin films with Sr(tmhd)2 and Ti(i-OPr)4

Type: Journal

Info: J. Vac. Sci. Technol. A 20(5), Sep/Oct 2002

Date: 2002-06-17

DOI: http://dx.doi.org/10.1116/1.1500745

Author Information

Name

Institution

Samsung Electronics Co.

Samsung Electronics Co.

Samsung Electronics Co.

Samsung Electronics Co.

Pohang University of Science and Technology (POSTECH)

Films

Plasma SrTiO3 using Custom

Deposition Temperature Range N/A

36830-74-7

546-68-9

7782-44-7

Plasma SrO using Custom

Deposition Temperature Range N/A

36830-74-7

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Chemical Composition, Impurities

SIMS, Secondary Ion Mass Spectrometry

Unknown

Conformality, Step Coverage

SEM, Scanning Electron Microscopy

Unknown

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

Unknown

Unknown

EOT, Equivalent Oxide Thickness

Unknown

Unknown

Leakage Current

Unknown

Unknown

Substrates

Ru

Keywords

Capacitors

Notes

Precursors dissolved in THF.

Cycle was Sr and Ti pulsed together/Ar purge/O2 plasma/Ar purge.

125



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