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Atomic layer deposited Al2O3 capping layer effect on environmentally assisted cracking in SiNx barrier films
Electrochemical Performance of Lithium-Nickel Oxide Thin Films Obtained with Use of Atomic Layer Deposition
Study of the surface species during thermal and plasma-enhanced atomic layer deposition of titanium oxide films using in situ IR-spectroscopy and in vacuo X-ray photoelectron spectroscopy
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Publication Information
Title:
Transient characterization of the electroforming process in TiO2 based resistive switching devices
Type:
Journal
Info:
Applied Physics Letters 102, 023507 (2013)
Date:
2013-01-02
Author Information
| Name | Institution |
|---|---|
| Mohammad Noman | Carnegie Mellon University |
| Abhishek A. Sharma | Carnegie Mellon University |
| Yi Meng Lu | Carnegie Mellon University |
| Marek Skowronski | Carnegie Mellon University |
| Paul A. Salvador | Carnegie Mellon University |
| James A. Bain | Carnegie Mellon University |
Films
Film/Plasma Properties
Substrates
| Pt |
Keywords
| Resistance RAM |
| Resistive Switch |
Notes
| 672 |
Popular Precursors
Top Authors
| Erwin (W.M.M.) Kessels |
| Hyeongtag Jeon |
| Hyungjun Kim |
| Mauritius C. M. (Richard) van de Sanden |
| Christophe Detavernier |