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Publication Information

Title: Transient characterization of the electroforming process in TiO2 based resistive switching devices

Type: Journal

Info: Applied Physics Letters 102, 023507 (2013)

Date: 2013-01-02

DOI: http://dx.doi.org/10.1063/1.4776693

Author Information

Name

Institution

Carnegie Mellon University

Carnegie Mellon University

Carnegie Mellon University

Carnegie Mellon University

Carnegie Mellon University

Carnegie Mellon University

Films

Plasma TiO2 using Unknown

Deposition Temperature = 200C

3275-24-9

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Substrates

Pt

Keywords

Resistance RAM

Resistive Switch

Notes

672


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