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Infrared single-photon sensitivity in atomic layer deposited superconducting nanowires
Effects of deposition temperature on the wear behavior and material properties of plasma enhanced atomic layer deposition (PEALD) titanium vanadium nitride thin films
Gallium nitride thin films by microwave plasma-assisted ALD
Ferroelectricity of HfxZr1-xO2 thin films fabricated by 300°C low temperature process with plasma-enhanced atomic layer deposition
Hydrogen-induced abstraction mechanism of surface methyl groups in atomic-layer-epitaxy of germanium
Transient characterization of the electroforming process in TiO2 based resistive switching devices
Type:
Journal
Info:
Applied Physics Letters 102, 023507 (2013)
Date:
2013-01-02
Author Information
| Name | Institution |
|---|---|
| Mohammad Noman | Carnegie Mellon University |
| Abhishek A. Sharma | Carnegie Mellon University |
| Yi Meng Lu | Carnegie Mellon University |
| Marek Skowronski | Carnegie Mellon University |
| Paul A. Salvador | Carnegie Mellon University |
| James A. Bain | Carnegie Mellon University |
Films
Film/Plasma Properties
Substrates
| Pt |
Notes
| 672 |