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Low-temperature growth of gallium oxide thin films by plasma-enhanced atomic layer deposition
Low-temperature plasma-enhanced atomic layer deposition of 2-D MoS2: large area, thickness control and tuneable morphology
Microstructure and Interfaces of Ultra-Thin Epitaxial AlN Films Grown by Plasma-Enhanced Atomic Layer Deposition at Relatively Low Temperatures
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Transient characterization of the electroforming process in TiO2 based resistive switching devices
Type:
Journal
Info:
Applied Physics Letters 102, 023507 (2013)
Date:
2013-01-02
Author Information
| Name | Institution |
|---|---|
| Mohammad Noman | Carnegie Mellon University |
| Abhishek A. Sharma | Carnegie Mellon University |
| Yi Meng Lu | Carnegie Mellon University |
| Marek Skowronski | Carnegie Mellon University |
| Paul A. Salvador | Carnegie Mellon University |
| James A. Bain | Carnegie Mellon University |
Films
Film/Plasma Properties
Substrates
| Pt |
Keywords
| Resistance RAM |
| Resistive Switch |
Notes
| 672 |