Publication Information

Title:
Passivation of Al2O3/TiO2 on monocrystalline Si with relatively low reflectance
Type:
Journal
Info:
2016 J. Phys. D: Appl. Phys. 49 245105
Date:
2016-04-15

Author Information

Name Institution
Chun-Ti LuNational Taiwan University
Yu-Shiang HuangNational Taiwan University
Chee Wee LiuNational Taiwan University

Films

Plasma Al2O3

Hardware used: Unknown


Plasma TiO2

Hardware used: Unknown


Film/Plasma Properties

Characteristic: Photoluminescence
Analysis: PL, PhotoLuminescence

Substrates

Silicon

Keywords

Passivation

Notes

825