Direct observation of microscopic change induced by oxygen vacancy drift in amorphous TiO2 thin films

Type:
Journal
Info:
Applied Physics Letters 97, 042109 (2010)
Date:
2010-07-06
DOI:
http://dx.doi.org/10.1063/1.3467854

Author Information

Name Institution
Hu Young JeongKorea Advanced Institute of Science and Technology
Jeong Yong LeeKorea Advanced Institute of Science and Technology
Sung-Yool ChoiElectronics and Telecommunication Research Institute, (ETRI)

Films

Plasma TiO2

Hardware used: ASM Genitech MP-1000
Deposition Temperature Range = 150-250C

Film/Plasma Properties

Characteristic: Images
Analysis: TEM, Transmission Electron Microscope
Diagnostic: JEOL 3010

Characteristic: Microstructure
Analysis: TEM, Transmission Electron Microscope
Diagnostic: JEOL 3010

Characteristic: Electrical Properties
Analysis: I-V, Current-Voltage Measurements
Diagnostic: Keithley 4200-SCS

Characteristic: Resistive Switching
Analysis: I-V, Current-Voltage Measurements
Diagnostic: Keithley 4200-SCS

Substrates

Al

Notes

1470