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Publication Information

Title: X-ray Photoelectron Spectroscopy Analyses of Atomic Layer Deposition-Prepared Titanium-Dioxide Thin Films with Oxygen Sources and Their Annealing Effect

Type: Journal

Info: Science of Advanced Materials, Volume 8, Number 2 2016, pp. 336-341

Date: 2016-02-01

DOI: http://dx.doi.org/doi:10.1166/sam.2016.2490

Author Information

Name

Institution

Hoseo University

Films

Plasma TiO2 using Unknown

Deposition Temperature Range N/A

3275-24-9

7782-44-7

Thermal TiO2 using Unknown

Deposition Temperature Range N/A

3275-24-9

7732-18-5

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

Unknown

Unknown

Chemical Composition, Impurities

XPS, X-ray Photoelectron Spectroscopy

Unknown

Substrates

Keywords

Notes

804



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