X-ray Photoelectron Spectroscopy Analyses of Atomic Layer Deposition-Prepared Titanium-Dioxide Thin Films with Oxygen Sources and Their Annealing Effect

Type:
Journal
Info:
Science of Advanced Materials, Volume 8, Number 2 2016, pp. 336-341
Date:
2016-02-01

Author Information

Name Institution
Woon-Seop ChoiHoseo University

Films

Plasma TiO2


Thermal TiO2


Film/Plasma Properties

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: -

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Substrates

Notes

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