Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

Contact us for more information.


Electronic Instabilities Leading to Electroformation of Binary Metal Oxide-based Resistive Switches

Type:
Journal
Info:
Advanced Functional Materials Volume 24, Issue 35, pages 5522-5529, September 17, 2014
Date:
2014-07-09
DOI:
http://dx.doi.org/10.1002/adfm.201400461

Author Information

Name Institution
Abhishek A. SharmaCarnegie Mellon University

Films

Plasma TiO2

Hardware used: Unknown
Deposition Temperature Range N/A

Film/Plasma Properties

Substrates

Notes

250