Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

Contact us for more information.


Impedance spectroscopy analysis on the effects of TiO2 interfacial atomic layers in ZnO nanorod polymer solar cells: Effects of interfacial charge extraction on diffusion and recombination

Type:
Journal
Info:
ACS Appl. Mater. Interfaces, 2015, 7 (19), pp 10228-10237
Date:
2015-04-28
DOI:
http://dx.doi.org/10.1016/j.orgel.2015.01.030

Author Information

Name Institution
Mi-Jin JinUlsan National Institute of Science and Technology
Junhyeon JoUlsan National Institute of Science and Technology
Jung-Woo YooUlsan National Institute of Science and Technology

Films

Plasma TiO2

Hardware used: Unknown
TDMATi, tetrakis(dimethylamido)titanium, titanium dimethylamide, (Me2N)4Ti
CAS#: 3275-24-9
Where to buy precursor
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature = 200C

Film/Plasma Properties

Substrates

ZnO

Notes

319