Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

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Highly efficient and bending durable perovskite solar cells: toward a wearable power source

Type:
Journal
Info:
Energy Environ. Sci., 2015, Advance Article
Date:
2014-10-03
DOI:
http://dx.doi.org/10.1039/C4EE02441A

Author Information

Name Institution
Byeong Jo KimSungkyunkwan University

Films

Plasma TiO2

Hardware used: Unknown
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature = 80C

Film/Plasma Properties

Substrates

Notes

PEALD TiO2 electron collection layer for flexible perovskite solar cells
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