Publication Information

Title: Effect of an Al2O3/TiO2 Passivation Layer on the Performance of Amorphous Zinc-Tin Oxide Thin-Film Transistors

Type: Journal

Info: Journal of Electronic Materials February 2015, Volume 44, Issue 2, pp 651-657

Date: 2014-12-10

DOI: http://dx.doi.org/10.1007/s11664-014-3554-y

Author Information

Name

Institution

Dong-Suk Han

Hanyang University

Films

Plasma Al2O3 using Unknown

Deposition Temperature Range = 33-102C

TMA, Trimethyl Aluminum, Trimethylalane, Trimethylaluminium, Aluminium Trimethyl, Aluminum Trimethanide, Al(CH3)3, AlMe3, Al2(CH3)6, Al2Me6

75-24-1

Where to buy precursor

Oxygen, O2

7782-44-7

Plasma TiO2 using Unknown

Deposition Temperature Range = 33-102C

TDMAT, Tetrakis[(DiMethyl)Amido]Titanium, [Me2N]4Ti

3275-24-9

Where to buy precursor

Oxygen, O2

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Diffusion Barrier Properties

Humidity Test

Unknown

Mobility

Unknown

Unknown

Subthreshold Swing

Unknown

Unknown

Unknown

XPS, X-ray Photoelectron Spectroscopy

Unknown

Thickness

Unknown

Unknown

Density

Unknown

Unknown

Substrates

ZnSnO (a-ZTO)

Keywords

Passivation

TFT, Thin Film Transistor

Diffusion Barrier

Notes

246


Mark Sowa

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