Publication Information

Title: Optimization of Al2O3/TiO2 nanolaminate thin films prepared with different oxide ratios, for use in organic light-emitting diode encapsulation, via plasma-enhanced atomic layer deposition

Type: Journal

Info: Phys. Chem. Chem. Phys., 2016, 18, 1042-1049

Date: 2015-11-18

DOI: http://dx.doi.org/10.1039/C5CP06713H

Author Information

Name

Institution

Pohang University of Science and Technology (POSTECH)

Pohang University of Science and Technology (POSTECH)

Korea National University of Transportation

Pohang University of Science and Technology (POSTECH)

Pohang University of Science and Technology (POSTECH)

Electronics and Telecommunication Research Institute, (ETRI)

Hanyang University

Yeungnam University

Pohang University of Science and Technology (POSTECH)

Films

Plasma Al2O3 using Unknown

Deposition Temperature = 100C

75-24-1

7782-44-7

Plasma TiO2 using Unknown

Deposition Temperature = 100C

3275-24-9

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Substrates

PEN, Polyethylene Napthalate

Keywords

Encapsulation

OLED

Diffusion Barrier

Nanolaminate

Notes

510



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