Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

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Moisture barrier and chemical corrosion protection of silver-based telescope mirrors using aluminum oxide films by plasma-enhanced atomic layer deposition

Type:
Journal
Info:
Proc. SPIE 8820, Nanoepitaxy: Materials and Devices V, 88200Y (September 19, 2013);
Date:
2013-09-13
DOI:
http://dx.doi.org/10.1117/12.2023826

Author Information

Name Institution
David M. FryaufUniversity of California - Santa Cruz
Andrew C. PhillipsUniversity of California - Santa Cruz
Nobuhiko P. KobayashiUniversity of California Observatories

Films

Plasma Al2O3

Hardware used: Unknown
TMA, Trimethylaluminum, Trimethylalumane, AlMe3, Al(CH3)3
CAS#: 75-24-1
Where to buy precursor
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature Range N/A

Plasma TiO2

Hardware used: Unknown
Deposition Temperature Range N/A

Plasma HfO2

Hardware used: Unknown
Deposition Temperature Range N/A

Film/Plasma Properties

Characteristic: Diffusion Barrier Properties
Analysis: -
Diagnostic: -

Characteristic: Reflectivity
Analysis: Optical Reflectivity
Diagnostic: -

Characteristic: Optical Properties
Analysis: Optical Absorption
Diagnostic: -

Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Diagnostic: -

Substrates

YF3
Y2O3
HfO2
TiO2

Notes

582