A rotary reactor for thermal and plasma-enhanced atomic layer deposition on powders and small objects

Type:
Journal
Info:
Surface and Coatings Technology Volume 213, December 2012, Pages 183-191
Date:
2012-10-19

Author Information

Name Institution
Delphine LongrieGhent University
Davy DeduytscheGhent University
Jo HaemersGhent University
Kris DriesenUmicore
Christophe DetavernierGhent University

Films

Thermal Al2O3


Plasma Al2O3



Thermal AlN


Plasma AlN


Film/Plasma Properties

Characteristic: Images
Analysis: SEM, Scanning Electron Microscopy

Characteristic: Precursor Utilization
Analysis: QMS, Quadrupole Mass Spectrometer

Characteristic: OES
Analysis: OES, Optical Emission Spectroscopy

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Chemical Composition, Impurities
Analysis: EDS, EDX, Energy Dispersive X-ray Spectroscopy

Characteristic: Conformality, Step Coverage
Analysis: TEM, Transmission Electron Microscope

Characteristic: Conformality, Step Coverage
Analysis: XRF, X-Ray Fluorescence

Substrates

ZnO
Stainless Steel
Ti
Glass

Keywords

Powders/Particles

Notes

Custom rotary PEALD system demonstrated with variety of films on different particles.
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