Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:

  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

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Mesoporous perovskite solar cells and the role of nanoscale compact layers for remarkable all-round high efficiency under both indoor and outdoor illumination

Type:
Journal
Info:
Nano Energy Volume 30, December 2016, Pages 460-469
Date:
2016-10-15

Author Information

Name Institution
Francesco Di GiacomoUniversity of Rome - Tor Vergata
Valerio ZardettoEindhoven University of Technology
G. LucarelliUniversity of Rome - Tor Vergata
L. CinĂ University of Rome - Tor Vergata
Aldo Di CarloUniversity of Rome - Tor Vergata
Mariadriana CreatoreEindhoven University of Technology
Thomas M. BrownUniversity of Rome - Tor Vergata

Films

Plasma TiO2

Hardware used: Unknown


Film/Plasma Properties

Substrates

ITO

Notes

949