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Infrared single-photon sensitivity in atomic layer deposited superconducting nanowires
Effects of deposition temperature on the wear behavior and material properties of plasma enhanced atomic layer deposition (PEALD) titanium vanadium nitride thin films
Gallium nitride thin films by microwave plasma-assisted ALD
Ferroelectricity of HfxZr1-xO2 thin films fabricated by 300°C low temperature process with plasma-enhanced atomic layer deposition
Hydrogen-induced abstraction mechanism of surface methyl groups in atomic-layer-epitaxy of germanium
Mesoporous perovskite solar cells and the role of nanoscale compact layers for remarkable all-round high efficiency under both indoor and outdoor illumination
Type:
Journal
Info:
Nano Energy Volume 30, December 2016, Pages 460-469
Date:
2016-10-15
Author Information
| Name | Institution |
|---|---|
| Francesco Di Giacomo | University of Rome - Tor Vergata |
| Valerio Zardetto | Eindhoven University of Technology |
| G. Lucarelli | University of Rome - Tor Vergata |
| L. Cinà | University of Rome - Tor Vergata |
| Aldo Di Carlo | University of Rome - Tor Vergata |
| Mariadriana Creatore | Eindhoven University of Technology |
| Thomas M. Brown | University of Rome - Tor Vergata |
Films
Film/Plasma Properties
Substrates
| ITO |
Notes
| 949 |