The publication database currently has 1609 entries.

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Growth of Gallium Nitride Films on Multilayer Graphene Template Using Plasma-Enhanced Atomic Layer Deposition Ni₈₀Fe₂₀ nanotubes with optimized spintronic functionalities prepared by atomic layer deposition On the Contact Optimization of ALD-Based MoS₂ FETs: Correlation of Processing Conditions and Interface Chemistry with Device Electrical Performance

Search 1609 plasma ALD publications by:

202 Films Compositions

272 Precursors and Plasma Gases

76 Deposition Hardwares

249 Film and Plasma Characteristics

Effects of TiO₂ Interfacial Atomic Layers on Device Performances and Exciton Dynamics in ZnO Nanorod Polymer Solar Cells

Type:

Journal

Info:

ACS Appl. Mater. Interfaces, 2014, 6 (14), pp 11649-11656

Date:

2014-07-02

DOI:

http://dx.doi.org/10.1021/am5024435

Author Information

Name	Institution
Mi-Jin Jin	Ulsan National Institute of Science and Technology

Films

Plasma TiO₂

Hardware used: Unknown

TDMATi, tetrakis(dimethylamido)titanium, titanium dimethylamide, (Me₂N)₄Ti

CAS#: 3275-24-9

Where to buy precursor

O₂, Oxygen

CAS#: 7782-44-7

Deposition Temperature = 200C

Film/Plasma Properties

Substrates

Keywords

Notes

227

The publication database currently has 1609 entries.

Search from:

202 Films Compositions

272 Precursors and Plasma Gases

76 Deposition Hardwares

249 Film and Plasma Characteristics

85 Theses