Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

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Effects of TiO2 Interfacial Atomic Layers on Device Performances and Exciton Dynamics in ZnO Nanorod Polymer Solar Cells

Type:
Journal
Info:
ACS Appl. Mater. Interfaces, 2014, 6 (14), pp 11649-11656
Date:
2014-07-02
DOI:
http://dx.doi.org/10.1021/am5024435

Author Information

Name Institution
Mi-Jin JinUlsan National Institute of Science and Technology

Films

Plasma TiO2

Hardware used: Unknown
TDMATi, tetrakis(dimethylamido)titanium, titanium dimethylamide, (Me2N)4Ti
CAS#: 3275-24-9
Where to buy precursor
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature = 200C

Film/Plasma Properties

Substrates

Notes

227