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Low-temperature growth of gallium oxide thin films by plasma-enhanced atomic layer deposition
Low-temperature plasma-enhanced atomic layer deposition of 2-D MoS2: large area, thickness control and tuneable morphology
Microstructure and Interfaces of Ultra-Thin Epitaxial AlN Films Grown by Plasma-Enhanced Atomic Layer Deposition at Relatively Low Temperatures
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Effects of TiO2 Interfacial Atomic Layers on Device Performances and Exciton Dynamics in ZnO Nanorod Polymer Solar Cells
Type:
Journal
Info:
ACS Appl. Mater. Interfaces, 2014, 6 (14), pp 11649-11656
Date:
2014-07-02
Author Information
| Name | Institution |
|---|---|
| Mi-Jin Jin | Ulsan National Institute of Science and Technology |
Films
Film/Plasma Properties
Substrates
Keywords
Notes
| 227 |