Publication Information

Title:
Low temperature deposition of 2D WS2 layers from WF6 and H2S precursors: impact of reducing agents
Type:
Journal
Info:
Chem. Commun., 2015, 51, 15692
Date:
2015-09-07

Author Information

Name Institution
Annelies DelabieIMEC
Matty CaymaxIMEC
Benjamin GrovenIMEC
Markus HeyneIMEC
K. HaesevoetsIMEC
Johan MeersschautIMEC
Thomas NuyttenIMEC
Hugo BenderIMEC
Thierry ConardIMEC
Patrick VerdonckIMEC
Sven Van ElshochtIMEC
Stefan De GendtIMEC
Marc HeynsIMEC
K. BarlaIMEC
Iuliana RaduIMEC
A. TheanIMEC

Films

Other WS2


Film/Plasma Properties

Characteristic: Chemical Composition, Impurities
Analysis: RBS, Rutherford Backscattering Spectrometry

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction

Characteristic: Images
Analysis: TEM, Transmission Electron Microscope

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: TEM, Transmission Electron Microscope

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: Raman Spectroscopy

Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy

Substrates

Al2O3

Keywords

Blistering

Notes

1391