Low temperature deposition of 2D WS2 layers from WF6 and H2S precursors: impact of reducing agents
Type:
Journal
Info:
Chem. Commun., 2015, 51, 15692
Date:
2015-09-07
Author Information
Name | Institution |
---|---|
Annelies Delabie | IMEC |
Matty Caymax | IMEC |
Benjamin Groven | IMEC |
Markus Heyne | IMEC |
K. Haesevoets | IMEC |
Johan Meersschaut | IMEC |
Thomas Nuytten | IMEC |
Hugo Bender | IMEC |
Thierry Conard | IMEC |
Patrick Verdonck | IMEC |
Sven Van Elshocht | IMEC |
Stefan De Gendt | IMEC |
Marc Heyns | IMEC |
K. Barla | IMEC |
Iuliana Radu | IMEC |
A. Thean | IMEC |
Films
Other WS2
Film/Plasma Properties
Characteristic: Chemical Composition, Impurities
Analysis: RBS, Rutherford Backscattering Spectrometry
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Characteristic: Images
Analysis: TEM, Transmission Electron Microscope
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: TEM, Transmission Electron Microscope
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: Raman Spectroscopy
Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Substrates
Al2O3 |
Notes
1391 |