Low temperature deposition of 2D WS2 layers from WF6 and H2S precursors: impact of reducing agents

Type:
Journal
Info:
Chem. Commun., 2015, 51, 15692
Date:
2015-09-07
DOI:
http://dx.doi.org/10.1039/C5CC05272F

Author Information

Name Institution
Annelies DelabieIMEC
Matty CaymaxIMEC
Benjamin GrovenIMEC
Markus HeyneIMEC
K. HaesevoetsIMEC
Johan MeersschautIMEC
Thomas NuyttenIMEC
Hugo BenderIMEC
Thierry ConardIMEC
Patrick VerdonckIMEC
Sven Van ElshochtIMEC
Stefan De GendtIMEC
Marc HeynsIMEC
K. BarlaIMEC
Iuliana RaduIMEC
A. TheanIMEC

Films

Other WS2

Hardware used: ASM Eagle 12
WF6, Tungsten Hexafluoride
CAS#: 7783-82-6
H2, Hydrogen
CAS#: 1333-74-0

Where to buy onsite generators

H2S, Hydrogen Sulfide
CAS#: 7783-06-4
Deposition Temperature = 300C

Film/Plasma Properties

Characteristic: Chemical Composition, Impurities
Analysis: RBS, Rutherford Backscattering Spectrometry
Diagnostic: -

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Diagnostic: -

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Diagnostic: -

Characteristic: Images
Analysis: TEM, Transmission Electron Microscope
Diagnostic: -

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: TEM, Transmission Electron Microscope
Diagnostic: -

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: Raman Spectroscopy
Diagnostic: -

Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Diagnostic: -

Substrates

Al2O3

Keywords

Blistering

Notes

1391