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Low temperature deposition of 2D WS2 layers from WF6 and H2S precursors: impact of reducing agents
Type:
Journal
Info:
Chem. Commun., 2015, 51, 15692
Date:
2015-09-07
Author Information
| Name | Institution |
|---|---|
| Annelies Delabie | IMEC |
| Matty Caymax | IMEC |
| Benjamin Groven | IMEC |
| Markus Heyne | IMEC |
| K. Haesevoets | IMEC |
| Johan Meersschaut | IMEC |
| Thomas Nuytten | IMEC |
| Hugo Bender | IMEC |
| Thierry Conard | IMEC |
| Patrick Verdonck | IMEC |
| Sven Van Elshocht | IMEC |
| Stefan De Gendt | IMEC |
| Marc Heyns | IMEC |
| K. Barla | IMEC |
| Iuliana Radu | IMEC |
| A. Thean | IMEC |
Films
Other WS2
Film/Plasma Properties
Characteristic: Chemical Composition, Impurities
Analysis: RBS, Rutherford Backscattering Spectrometry
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Characteristic: Images
Analysis: TEM, Transmission Electron Microscope
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: TEM, Transmission Electron Microscope
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: Raman Spectroscopy
Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Substrates
| Al2O3 |
Keywords
| Blistering |
Notes
| 1391 |