Publication Information

Title:
Plasma-Enhanced Atomic Layer Deposition of Two-Dimensional WS2 from WF6, H2 Plasma, and H2S
Type:
Journal
Info:
Chem. Mater. 2017, 29, 2927-2938
Date:
2017-03-07

Author Information

Name Institution
Benjamin GrovenKU Leuven
Markus HeyneKU Leuven
Ankit Nalin MehtaIMEC
Hugo BenderIMEC
Thomas NuyttenIMEC
Johan MeersschautIMEC
Thierry ConardIMEC
Patrick VerdonckIMEC
Sven Van ElshochtIMEC
Wilfried VandervorstIMEC
Stefan De GendtKU Leuven
Marc HeynsIMEC
Iuliana RaduIMEC
Matty CaymaxIMEC
Annelies DelabieKU Leuven

Films

Other WS2


Film/Plasma Properties

Characteristic: Plasma Species
Analysis: OES, Optical Emission Spectroscopy

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Bonding States
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: TEM, Transmission Electron Microscope

Characteristic: Morphology, Roughness, Topography
Analysis: TEM, Transmission Electron Microscope

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: TEM, Transmission Electron Microscope

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: Raman Spectroscopy

Characteristic: Chemical Composition, Impurities
Analysis: RBS, Rutherford Backscattering Spectrometry

Characteristic: Areal Density
Analysis: RBS, Rutherford Backscattering Spectrometry

Substrates

Al2O3

Keywords

2D Material

Notes

1121