Nucleation mechanism during WS2 plasma enhanced atomic layer deposition on amorphous Al2O3 and sapphire substrates
Type:
Journal
Info:
Journal of Vacuum Science & Technology A 36, 01A105 (2018)
Date:
2017-10-16
Author Information
| Name | Institution |
|---|---|
| Benjamin Groven | KU Leuven |
| Ankit Nalin Mehta | KU Leuven |
| Hugo Bender | IMEC |
| Quentin Smets | IMEC |
| Johan Meersschaut | IMEC |
| A. Franquet | IMEC |
| Thierry Conard | IMEC |
| Thomas Nuytten | IMEC |
| Patrick Verdonck | IMEC |
| Wilfried Vandervorst | KU Leuven |
| Marc Heyns | KU Leuven |
| Iuliana Radu | IMEC |
| Matty Caymax | IMEC |
| Annelies Delabie | KU Leuven |
Films
Other WS2
Film/Plasma Properties
Characteristic: Chemical Composition, Impurities
Analysis: RBS, Rutherford Backscattering Spectrometry
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Bonding States
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Chemical Composition, Impurities
Analysis: TOF-SIMS, Time of Flight Secondary Ion Mass Spectrometry
Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: TEM, Transmission Electron Microscope
Characteristic: Raman Spectra
Analysis: Raman Spectroscopy
Characteristic: Photoluminescence
Analysis: PL, PhotoLuminescence
Characteristic: Resistivity, Sheet Resistance
Analysis: TLM, Transmission Line Measurement
Substrates
| Al2O3 |
| Sapphire |
Notes
| 1104 |