Comparative study of thermal and radical-enhanced methods for growing boron nitride films from diborane and ammonia
Type:
Journal
Info:
Journal of Vacuum Science & Technology A 38, 033411 (2020)
Date:
2020-04-01
Author Information
| Name | Institution |
|---|---|
| Ramazan Oguzhan Apaydin | University of Twente |
| Arnoud J. Onnink | University of Twente |
| Xingyu Liu | University of Twente |
| Antonius A. I. Aarnink | University of Twente |
| Michel P. de Jong | University of Twente |
| Dirk. J. Gravesteijn | University of Twente |
| Alexey Y. Kovalgin | University of Twente |
Films
Thermal BN
Plasma BN
Plasma BN
Film/Plasma Properties
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Chemical Binding
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: Refractive Index
Analysis: Ellipsometry
Characteristic: Extinction Coefficient
Analysis: Ellipsometry
Characteristic: Uniformity
Analysis: Ellipsometry
Characteristic: Microstructure
Analysis: TEM, Transmission Electron Microscope
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: GIXRD, Grazing Incidence X-Ray Diffraction
Characteristic: Thickness
Analysis: XRR, X-Ray Reflectivity
Characteristic: Density
Analysis: XRR, X-Ray Reflectivity
Substrates
| Si(100) |
| SiO2 |
Notes
| 1499 |