Publication Information

Title:
Comparative study of thermal and radical-enhanced methods for growing boron nitride films from diborane and ammonia
Type:
Journal
Info:
Journal of Vacuum Science & Technology A 38, 033411 (2020)
Date:
2020-04-01

Author Information

Name Institution
Ramazan Oguzhan ApaydinUniversity of Twente
Arnoud J. OnninkUniversity of Twente
Xingyu LiuUniversity of Twente
Antonius A. I. AarninkUniversity of Twente
Michel P. de JongUniversity of Twente
Dirk. J. GravesteijnUniversity of Twente
Alexey Y. KovalginUniversity of Twente

Films

Thermal BN


Plasma BN


Plasma BN


Film/Plasma Properties

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Chemical Binding
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Refractive Index
Analysis: Ellipsometry

Characteristic: Extinction Coefficient
Analysis: Ellipsometry

Characteristic: Uniformity
Analysis: Ellipsometry

Characteristic: Microstructure
Analysis: TEM, Transmission Electron Microscope

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: GIXRD, Grazing Incidence X-Ray Diffraction

Characteristic: Thickness
Analysis: XRR, X-Ray Reflectivity

Characteristic: Density
Analysis: XRR, X-Ray Reflectivity

Substrates

Si(100)
SiO2

Keywords

Plasma vs Thermal Comparison

Notes

1499