Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

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B2H6, Diborane, Boroethane, Boron hydride, Diboron hexahydride, CAS# 19287-45-7

Informational Websites

NumberWebsite
1https://en.wikipedia.org/wiki/Diborane
2https://www.wonderwhizkids.com/conceptmaps/Diborane.html

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 2 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Investigation of Tungsten Nitride Deposition Using Tungsten Hexafluoride Precursor for Via and Plug Metallization
2Comparative study of thermal and radical-enhanced methods for growing boron nitride films from diborane and ammonia