Initial growth, refractive index, and crystallinity of thermal and plasma-enhanced atomic layer deposition AlN films
Type:
Journal
Info:
J. Vac. Sci. Technol. A 33(1), Jan/Feb 2015
Date:
2014-10-07
Author Information
| Name | Institution |
|---|---|
| Hao Van Bui | University of Twente |
| Frank B. Wiggers | University of Twente |
| Anubha Gupta | University of Twente |
| Minh D. Nguyen | University of Twente |
| Antonius A. I. Aarnink | University of Twente |
| Michel P. de Jong | University of Twente |
| Alexey Y. Kovalgin | University of Twente |
Films
Plasma AlN
Plasma AlN
Thermal AlN
Film/Plasma Properties
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: Refractive Index
Analysis: Ellipsometry
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Conformality, Step Coverage
Analysis: SEM, Scanning Electron Microscopy
Substrates
Notes
| Picosun plasma and thermal AlN study. |
| 176 |