Publication Information

Title:
Initial growth, refractive index, and crystallinity of thermal and plasma-enhanced atomic layer deposition AlN films
Type:
Journal
Info:
J. Vac. Sci. Technol. A 33(1), Jan/Feb 2015
Date:
2014-10-07

Author Information

Name Institution
Hao Van BuiUniversity of Twente
Frank B. WiggersUniversity of Twente
Anubha GuptaUniversity of Twente
Minh D. NguyenUniversity of Twente
Antonius A. I. AarninkUniversity of Twente
Michel P. de JongUniversity of Twente
Alexey Y. KovalginUniversity of Twente

Films

Plasma AlN


Plasma AlN


Thermal AlN


Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Refractive Index
Analysis: Ellipsometry

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction

Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Conformality, Step Coverage
Analysis: SEM, Scanning Electron Microscopy

Substrates

Keywords

Notes

Picosun plasma and thermal AlN study.
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