Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

Contact us for more information.


AlInN Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications discussing AlInN films returned 3 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Perspectives on future directions in III-N semiconductor research
2Atomic layer epitaxy for quantum well nitride-based devices
3Growth and characterization of III-N ternary thin films by plasma assisted atomic layer epitaxy at low temperatures