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An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

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GaP Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications discussing GaP films returned 11 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Thin film GaP for solar cell application
2Influence of PE-ALD of GaP on the Silicon Wafers Quality
3Low temperature epitaxial growth of GaP on Si by atomic-layer deposition with plasma activation
4Optical emission spectroscopy of gallium phosphide plasma-enhanced atomic layer deposition
5Interface Properties of GaP/Si Heterojunction Fabricated by PE-ALD
6Low temperature plasma enhanced deposition of GaP films on Si substrate
7Influence of plasma on electrophysical properties of the GaP/n-Si isotype heterojunction grown by PE-ALD
8n-GaP/p-Si Heterojunction Solar Cells Fabricated by PE-ALD
9Lateral conductivity of n-GaP/p-Si heterojunction with an inversion layer
10Study of GaP/Si Heterojunction Solar Cells
11Capacitance characterization of GaP/n-Si structures grown by PE-ALD