Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

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Optical emission spectroscopy of gallium phosphide plasma-enhanced atomic layer deposition

Type:
Conference Proceedings
Info:
Journal of Physics: Conf. Series 1038 (2018) 012108
Date:
2018-06-01
DOI:
http://dx.doi.org/10.1088/1742-6596/1038/1/012108

Author Information

Name Institution
Alexander V. UvarovSt. Petersburg Academic University
Alexander S. GudovskikhSt. Petersburg Academic University

Films

Plasma GaP

Hardware used: Oxford Instruments Plasmalab 100
TMG, trimethyl galium, GaMe3
CAS#: 1445-79-0
Where to buy precursor
PH3, Phospine, Phosphane
CAS#: 7803-51-2
H2, Hydrogen
CAS#: 1333-74-0

Where to buy onsite generators

Deposition Temperature Range N/A

Film/Plasma Properties

Characteristic: Plasma Species
Analysis: OES, Optical Emission Spectroscopy
Diagnostic: Solar Laser Systems S100

Substrates

Notes

1467