Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

Contact us for more information.


Alexander V. Uvarov Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Alexander V. Uvarov returned 7 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Low temperature plasma enhanced deposition of GaP films on Si substrate
2Optical emission spectroscopy of gallium phosphide plasma-enhanced atomic layer deposition
3Interface Properties of GaP/Si Heterojunction Fabricated by PE-ALD
4n-GaP/p-Si Heterojunction Solar Cells Fabricated by PE-ALD
5Influence of plasma on electrophysical properties of the GaP/n-Si isotype heterojunction grown by PE-ALD
6Lateral conductivity of n-GaP/p-Si heterojunction with an inversion layer
7Low temperature epitaxial growth of GaP on Si by atomic-layer deposition with plasma activation