Publication Information

Title:
Low temperature plasma enhanced deposition of GaP films on Si substrate
Type:
Journal
Info:
Journal of Vacuum Science & Technology A 36, 021302 (2018)
Date:
2017-11-13

Author Information

Name Institution
Alexander S. GudovskikhSt. Petersburg Academic University
Ivan A. MorozovSt. Petersburg Academic University
Alexander V. UvarovSt. Petersburg Academic University
Dmitry A. KudryashovSt. Petersburg Academic University
E.V. NikitinaSt. Petersburg Academic University
Anton S. BukatinSt. Petersburg Academic University
Vladimir N. NevedomskiyIoffe Institute
Jean-Paul KleiderGeePs Group of electrical engineering - Paris

Films

Plasma GaP


Film/Plasma Properties

Characteristic: Thickness
Analysis: SEM, Scanning Electron Microscopy

Characteristic: Morphology, Roughness, Topography
Analysis: SEM, Scanning Electron Microscopy

Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: Raman Spectroscopy

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: Electron Diffraction

Characteristic: Plasma Species
Analysis: OES, Optical Emission Spectroscopy

Characteristic: Microstructure
Analysis: TEM, Transmission Electron Microscope

Substrates

Si(001)

Keywords

Notes

1098