Your search for plasma enhanced atomic layer deposition publications discussing WCN films returned 4 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.
|1||Characteristics of WNxCy films deposited using remote plasma atomic layer deposition with (MeCp)W(CO)2(NO) for Cu diffusion barrier|
|2||Development of plasma-enhanced atomic layer deposition grown Ru-WCN mixed phase films for nanoscale diffusion barrier and copper direct-plate applications|
|3||Pulse plasma assisted atomic layer deposition of W–C–N thin films for Cu interconnects|
|4||Work function tuning of plasma-enhanced atomic layer deposited WCxNy electrodes for metal/oxide/semiconductor devices|
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