Work function tuning of plasma-enhanced atomic layer deposited WCxNy electrodes for metal/oxide/semiconductor devices
Type:
Journal
Info:
Applied Physics Letters 106, 082107 (2015)
Date:
2015-02-17
Author Information
| Name | Institution |
|---|---|
| Oren Zonensain | Technion-Israel Institute of Technology |
| Sivan Fadida | Technion-Israel Institute of Technology |
| Ilanit Fisher | Lam Research Corporation |
| Juwen Gao | Lam Research Corporation |
| Kaushik Chattopadhyay | Lam Research Corporation |
| Greg Harm | Lam Research Corporation |
| Tom Mountsier | Lam Research Corporation |
| Michal Danek | Lam Research Corporation |
| Moshe Eizenberg | Technion-Israel Institute of Technology |
Films
Thermal WCN
Film/Plasma Properties
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Bonding States
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Flat Band Voltage
Analysis: C-V, Capacitance-Voltage Measurements
Characteristic: Doping Density
Analysis: C-V, Capacitance-Voltage Measurements
Characteristic: Work Function
Analysis: C-V, Capacitance-Voltage Measurements
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: Continuity
Analysis: TEM, Transmission Electron Microscope
Characteristic: Thickness
Analysis: TEM, Transmission Electron Microscope
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: TEM, Transmission Electron Microscope
Characteristic: Interfacial Layer
Analysis: TEM, Transmission Electron Microscope
Substrates
| SiO2 |
Notes
| Precursor details omitted. Plasma films used precursor containing W, C, N, H, and O while thermal films used a precursor with W, C, N, and H. |
| Oxygen containing precursors might be MDNOW (methylcyclopentadienyl-dicarbonyInitrosyl-tungsten) or EDNOW (ethylcyclopentadienyl-dicarbonyInitrosyl-tungsten) discussed in United States Patent Application 20150024592 assigned to Lam Research. |
| 308 |