Work function tuning of plasma-enhanced atomic layer deposited WCxNy electrodes for metal/oxide/semiconductor devices
Type:
Journal
Info:
Applied Physics Letters 106, 082107 (2015)
Date:
2015-02-17
Author Information
Name | Institution |
---|---|
Oren Zonensain | Technion-Israel Institute of Technology |
Sivan Fadida | Technion-Israel Institute of Technology |
Ilanit Fisher | Lam Research Corporation |
Juwen Gao | Lam Research Corporation |
Kaushik Chattopadhyay | Lam Research Corporation |
Greg Harm | Lam Research Corporation |
Tom Mountsier | Lam Research Corporation |
Michal Danek | Lam Research Corporation |
Moshe Eizenberg | Technion-Israel Institute of Technology |
Films
Thermal WCN
Film/Plasma Properties
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Bonding States
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Flat Band Voltage
Analysis: C-V, Capacitance-Voltage Measurements
Characteristic: Doping Density
Analysis: C-V, Capacitance-Voltage Measurements
Characteristic: Work Function
Analysis: C-V, Capacitance-Voltage Measurements
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: Continuity
Analysis: TEM, Transmission Electron Microscope
Characteristic: Thickness
Analysis: TEM, Transmission Electron Microscope
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: TEM, Transmission Electron Microscope
Characteristic: Interfacial Layer
Analysis: TEM, Transmission Electron Microscope
Substrates
SiO2 |
Notes
Precursor details omitted. Plasma films used precursor containing W, C, N, H, and O while thermal films used a precursor with W, C, N, and H. |
Oxygen containing precursors might be MDNOW (methylcyclopentadienyl-dicarbonyInitrosyl-tungsten) or EDNOW (ethylcyclopentadienyl-dicarbonyInitrosyl-tungsten) discussed in United States Patent Application 20150024592 assigned to Lam Research. |
308 |