Your search for plasma enhanced atomic layer deposition publications discussing WC films returned 4 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.
|1||A controlled growth of WNx and WCx thin films prepared by atomic layer deposition|
|2||Atomic layer deposited nanocrystalline tungsten carbides thin films as a metal gate and diffusion barrier for Cu metallization|
|3||Characteristics of Tungsten Carbide Films Prepared by Plasma-Assisted ALD Using Bis(tert-butylimido)bis(dimethylamido)tungsten|
|4||Work function tuning of plasma-enhanced atomic layer deposited WCxNy electrodes for metal/oxide/semiconductor devices|
© 2014-2019 plasma-ald.com