Publication Information

Title: Growth of amorphous zinc tin oxide films using plasma-enhanced atomic layer deposition from bis(1-dimethylamino-2-methyl-2propoxy)tin, diethylzinc, and oxygen plasma

Type: Journal

Info: Applied Surface Science 357, Part A (2015) 672 - 677

Date: 2015-09-06

DOI: http://dx.doi.org/10.1016/j.apsusc.2015.09.062

Author Information

Name

Institution

Korea Research Institute of Chemical Technology

Korea Research Institute of Chemical Technology

Korea Research Institute of Chemical Technology

Korea Research Institute of Chemical Technology

Korea Research Institute of Chemical Technology

Korea Research Institute of Chemical Technology

Korea Research Institute of Chemical Technology

Korea Research Institute of Chemical Technology

Films

Plasma ZnSnO using Unknown

Deposition Temperature Range = 100-200C

557-20-0

0-0-0

7782-44-7

Plasma ZnO using Unknown

Deposition Temperature Range = 100-200C

557-20-0

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Chemical Composition, Impurities

XPS, X-ray Photoelectron Spectroscopy

-

Bonding States

XPS, X-ray Photoelectron Spectroscopy

-

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

GIXRD, Grazing Incidence X-Ray Diffraction

-

Morphology, Roughness, Topography

Unknown

-

Conformality, Step Coverage

Unknown

-

Substrates

Keywords

Notes

475



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