About Plasma ALD, LLC

The Plasma Enhanced Atomic Layer Deposition Publication Database is developed and maintained by Plasma ALD, LLC, a developer and supplier of inductively coupled plasma (ICP) sources for plasma-enhanced atomic layer deposition (PEALD), atomic layer etch (ALE), thin-film etching, surface cleaning, surface modification, and research plasma systems.

Our ICP sources are designed for integration with existing ALD and vacuum-processing equipment. Plasma ALD also provides plasma-source integration, process-development, and troubleshooting assistance based on decades of experience with low-pressure plasma processing and PEALD systems.

Researchers, universities, equipment manufacturers, and laboratories looking for an ICP plasma source or assistance adding plasma capability to a vacuum system can learn more on our Plasma Sources page.

Temporal and spatial atomic layer deposition of Al-doped zinc oxide as a passivating conductive contact for silicon solar cells

Type:
Journal
Info:
Solar Energy Materials and Solar Cells, Volume 245, 2022, Pages 111869
Date:
2022-06-26

Author Information

Name Institution
Bart MaccoEindhoven University of Technology
Mike L. van de PollEindhoven University of Technology
B. W. H. van de LooSoLayTec
Tim M.P. BroekemaEindhoven University of Technology
Saravana Balaji BasuvalingamEindhoven University of Technology
Cristian Van HelvoirtEindhoven University of Technology
Wilhelmus J.H. BerghuisEindhoven University of Technology
Roel J. TheeuwesEindhoven University of Technology
Nga PhungEindhoven University of Technology
Erwin (W.M.M.) KesselsEindhoven University of Technology

Films

Thermal Al:ZnO


Thermal Al:ZnO


Film/Plasma Properties

Characteristic: Passivation
Analysis: -

Characteristic: Open Circuit Voltage
Analysis: -

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Refractive Index
Analysis: Ellipsometry

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Wet Etch Resistance
Analysis: Custom

Substrates

Si with native oxide

Notes

1741