Publication Information

Title: Effect of hydrogen peroxide pretreatment on ZnO-based metal-semiconductor-metal ultraviolet photodetectors deposited using plasma-enhanced atomic layer deposition

Type: Journal

Info: Journal of Vacuum Science & Technology A 34, 01A110 (2016)

Date: 2015-10-01

DOI: http://dx.doi.org/10.1116/1.4933169

Author Information

Name

Institution

National Cheng Kung University

National Cheng Kung University

Metal Industries Research and Development Centre

Films

Plasma ZnO using Unknown

Deposition Temperature Range N/A

557-20-0

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Thickness

Profilometry

Tencor Alpha-Step Profilometer

Morphology, Roughness, Topography

SEM, Scanning Electron Microscopy

JEOL JSM-7001F

Morphology, Roughness, Topography

AFM, Atomic Force Microscopy

Unknown

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

XRD, X-Ray Diffraction

Unknown

Chemical Composition, Impurities

XPS, X-ray Photoelectron Spectroscopy

Unknown

Electrical Properties

Unknown

Agilent 4156C

Photoconductance

Unknown

Unknown

Substrates

Sapphire

Keywords

Notes

403



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