Publication Information

Title:
Effect of hydrogen peroxide pretreatment on ZnO-based metal-semiconductor-metal ultraviolet photodetectors deposited using plasma-enhanced atomic layer deposition
Type:
Journal
Info:
Journal of Vacuum Science & Technology A 34, 01A110 (2016)
Date:
2015-10-01

Author Information

Name Institution
Yu-Chang LinNational Cheng Kung University
Hsin-Ying LeeNational Cheng Kung University
Tsung-Hsin LeeMetal Industries Research and Development Centre

Films

Plasma ZnO


Film/Plasma Properties

Characteristic: Thickness
Analysis: Profilometry

Characteristic: Morphology, Roughness, Topography
Analysis: SEM, Scanning Electron Microscopy

Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Electrical Properties
Analysis: -

Characteristic: Photoconductance
Analysis: -

Substrates

Sapphire

Keywords

Notes

403