Publication Information

Title:
ZnO Thin Films Fabricated by Plasma-Assisted Atomic Layer Deposition
Type:
Journal
Info:
Japanese Journal of Applied Physics 50 (2011) 04DF05
Date:
2010-12-15

Author Information

Name Institution
Yumi KawamuraNara Institute of Science and Technology
Nozomu HattoriMitsui Engineering & Shipbuilding Co., Ltd.
Naomasa MiyatakeMitsui Engineering & Shipbuilding Co., Ltd.
Masahiro HoritaNara Institute of Science and Technology
Yukiharu UraokaCREST, Japan Science and Technology Agency

Films

Plasma ZnO


Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Refractive Index
Analysis: Ellipsometry

Characteristic: Compositional Depth Profiling
Analysis: TOF-SIMS, Time of Flight Secondary Ion Mass Spectrometry

Characteristic: Transistor Characteristics
Analysis: Transistor Characterization

Substrates

Silicon

Keywords

Notes

1361