Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

Contact us for more information.


Masahiro Horita Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Masahiro Horita returned 3 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1ZnO Thin Films Fabricated by Plasma-Assisted Atomic Layer Deposition
2Leakage Current Reduction in ALD-Al2O3 Dielectric Deposited on Si by High Pressure Deuterium Oxide Annealing
3Characterizations of Al2O3 gate dielectric deposited on n-GaN by plasma-assisted atomic layer deposition