Search 1530 plasma ALD publications by:
Search 1530 plasma ALD publications by:
Publication Information
Title:
AlN passivation by plasma-enhanced atomic layer deposition for GaN-based power switches and power amplifiers
Type:
Journal
Info:
2013 Semicond. Sci. Technol. 28, 074015
Date:
2013-01-04
Author Information
Name | Institution |
---|---|
Kevin J. Chen | Hong Kong University of Science and Technology |
Sen Huang | Chinese Academy of Sciences |
Films
Film/Plasma Properties
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: TEM, Transmission Electron Microscope
Characteristic: Fixed Charge
Analysis: C-V, Capacitance-Voltage Measurements
Characteristic: Capacitance
Analysis: C-V, Capacitance-Voltage Measurements
Characteristic: Interface Trap Density
Analysis: C-V, Capacitance-Voltage Measurements
Characteristic: Compositional Depth Profiling
Analysis: XPS, X-ray Photoelectron Spectroscopy
Substrates
GaN |
Keywords
Passivation |
Notes
581 |
Popular Precursors
Top Authors
Erwin (W.M.M.) Kessels |
Hyeongtag Jeon |
Hyungjun Kim |
Mauritius C. M. (Richard) van de Sanden |
Christophe Detavernier |