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An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

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RF Characterization of Novel Superconducting Materials and Multilayers

Type:
Conference Proceedings
Info:
SRF2019, Dresden, Germany
Date:
2019-06-30
DOI:
http://dx.doi.org/10.18429/JACoW-SRF2019-THP044

Author Information

Name Institution
T. OseroffCornell University
M. LiepeCornell University
B. MoecklySTAR Cryoelectronics
Mark J. SowaVeeco Instruments
Zhipei SunCornell University

Films

Plasma NbN

Hardware used: Veeco - Ultratech - Cambridge NanoTech Fiji
TBTDEN, Tris(diethylamido)(tert-butylimido)niobium
CAS#: 210363-27-2
Where to buy precursor
N2, Nitrogen
CAS#: 7727-37-9
H2, Hydrogen
CAS#: 1333-74-0

Where to buy onsite generators

Deposition Temperature = 300C

Plasma NbTiN

Hardware used: Veeco - Ultratech - Cambridge NanoTech Fiji
TBTDEN, Tris(diethylamido)(tert-butylimido)niobium
CAS#: 210363-27-2
Where to buy precursor
TDMATi, tetrakis(dimethylamido)titanium, titanium dimethylamide, (Me2N)4Ti
CAS#: 3275-24-9
Where to buy precursor
N2, Nitrogen
CAS#: 7727-37-9
H2, Hydrogen
CAS#: 1333-74-0

Where to buy onsite generators

Deposition Temperature = 300C

Film/Plasma Properties

Characteristic: Superconductivity
Analysis: -
Diagnostic: -

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Diagnostic: -

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Diagnostic: -

Characteristic: Morphology, Roughness, Topography
Analysis: SEM, Scanning Electron Microscopy
Diagnostic: -

Substrates

AlN
Nb

Notes

1736