Publication Information

Title:
Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates
Type:
Journal
Info:
Chem. Vap. Deposition 2007, 13, 408–413
Date:
2007-03-06

Author Information

Name Institution
Antti NiskanenUniversity of Helsinki
Timo T. HatanpääUniversity of Helsinki
Kai ArstilaUniversity of Helsinki
Markku A. LeskeläUniversity of Helsinki
Mikko K. RitalaUniversity of Helsinki

Films



Film/Plasma Properties

Characteristic: Precursor Characterization
Analysis: CHN Elemental Analysis

Characteristic: Precursor Characterization
Analysis: FTIR, Fourier Transform InfraRed spectroscopy

Characteristic: Precursor Characterization
Analysis: NMR, Nuclear Magnetic Resonance

Characteristic: Precursor Characterization
Analysis: QMS, Quadrupole Mass Spectrometer

Characteristic: Precursor Characterization
Analysis: SDTA, Simultaneous Difference Thermal Analysis

Characteristic: Precursor Characterization
Analysis: TGA, Thermo Gravimetric Analysis

Characteristic: Conformality, Step Coverage
Analysis: SEM, Scanning Electron Microscopy

Characteristic: Density
Analysis: XRR, X-Ray Reflectivity

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction

Characteristic: Morphology, Roughness, Topography
Analysis: XRR, X-Ray Reflectivity

Characteristic: Morphology, Roughness, Topography
Analysis: SEM, Scanning Electron Microscopy

Characteristic: Chemical Composition, Impurities
Analysis: TOF-ERDA, Time-Of-Flight Elastic Recoil Detection Analysis

Characteristic: Resistivity, Sheet Resistance
Analysis: -

Characteristic: Thickness
Analysis: EDS, EDX, Energy Dispersive X-ray Spectroscopy

Substrates

Glass
Silicon

Keywords

Atomic Layer Deposition
Plasma
Radicals
Silver

Notes

Aeronex GateKeeper gas purifiers used
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