Publication Information

Title: Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates

Type: Journal

Info: Chem. Vap. Deposition 2007, 13, 408–413

Date: 2007-03-06

DOI: http://dx.doi.org/10.1002/cvde.200606519

Author Information

Name

Institution

University of Helsinki

University of Helsinki

University of Helsinki

University of Helsinki

University of Helsinki

Films

Deposition Temperature = 140C

0-0-0

1333-74-0

Deposition Temperature Range N/A

0-0-0

1333-74-0

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Precursor Characterization

CHN Elemental Analysis

-

Precursor Characterization

FTIR, Fourier Transform InfraRed spectroscopy

-

Precursor Characterization

NMR, Nuclear Magnetic Resonance

-

Precursor Characterization

QMS, Quadrupole Mass Spectrometer

-

Precursor Characterization

SDTA, Simultaneous Difference Thermal Analysis

-

Precursor Characterization

TGA, Thermo Gravimetric Analysis

-

Conformality, Step Coverage

SEM, Scanning Electron Microscopy

Hitachi S-4800 Field Emission Scanning Electron Microscope

Density

XRR, X-Ray Reflectivity

Bruker-Axs D8 Advance diffractometer/reflectometer

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

XRD, X-Ray Diffraction

Bruker-Axs D8 Advance diffractometer/reflectometer

Morphology, Roughness, Topography

XRR, X-Ray Reflectivity

Bruker-Axs D8 Advance diffractometer/reflectometer

Morphology, Roughness, Topography

SEM, Scanning Electron Microscopy

Hitachi S-4800 Field Emission Scanning Electron Microscope

Chemical Composition, Impurities

TOF-ERDA, Time-Of-Flight Elastic Recoil Detection Analysis

-

Resistivity, Sheet Resistance

Unknown

-

Thickness

EDS, EDX, Energy Dispersive X-ray Spectroscopy

Oxford INCA 350 Energy Spectrometer

Substrates

Glass

Silicon

Keywords

Atomic Layer Deposition

Plasma

Radicals

Silver

Notes

Aeronex GateKeeper gas purifiers used

41



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