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Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates

Type:
Journal
Info:
Chem. Vap. Deposition 2007, 13, 408–413
Date:
2007-03-06

Author Information

Name Institution
Antti NiskanenUniversity of Helsinki
Timo T. HatanpääUniversity of Helsinki
Kai ArstilaUniversity of Helsinki
Markku A. LeskeläUniversity of Helsinki
Mikko K. RitalaUniversity of Helsinki

Films

Plasma Ag


Plasma Ag


Film/Plasma Properties

Characteristic: Precursor Characterization
Analysis: CHN Elemental Analysis

Characteristic: Precursor Characterization
Analysis: FTIR, Fourier Transform InfraRed spectroscopy

Characteristic: Precursor Characterization
Analysis: NMR, Nuclear Magnetic Resonance

Characteristic: Precursor Characterization
Analysis: QMS, Quadrupole Mass Spectrometer

Characteristic: Precursor Characterization
Analysis: SDTA, Simultaneous Difference Thermal Analysis

Characteristic: Precursor Characterization
Analysis: TGA, Thermo Gravimetric Analysis

Characteristic: Conformality, Step Coverage
Analysis: SEM, Scanning Electron Microscopy

Characteristic: Density
Analysis: XRR, X-Ray Reflectivity

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction

Characteristic: Morphology, Roughness, Topography
Analysis: XRR, X-Ray Reflectivity

Characteristic: Morphology, Roughness, Topography
Analysis: SEM, Scanning Electron Microscopy

Characteristic: Chemical Composition, Impurities
Analysis: TOF-ERDA, Time-Of-Flight Elastic Recoil Detection Analysis

Characteristic: Resistivity, Sheet Resistance
Analysis: -

Characteristic: Thickness
Analysis: EDS, EDX, Energy Dispersive X-ray Spectroscopy

Substrates

Glass
Silicon

Notes

Aeronex GateKeeper gas purifiers used
41