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An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
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  • Surface cleaning
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ASM Microchemistry F-120 Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications using ASM Microchemistry F-120 hardware returned 7 records. If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Radical Enhanced Atomic Layer Deposition of Metals and Oxides
2Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates
3Low-Temperature Deposition of Aluminum Oxide by Radical Enhanced Atomic Layer Deposition - Thesis Coverage
4Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
5Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates - Thesis Coverage
6Radical-Enhanced Atomic Layer Deposition of Metallic Copper Thin Films - Thesis Coverage
7Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage