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Publication Information

Title: Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates - Thesis Coverage

Type: Thesis

Info: Niskanen Thesis

Date: 2006-11-10

DOI: No DOI

Author Information

Name

Institution

University of Helsinki

University of Helsinki

University of Helsinki

University of Helsinki

University of Helsinki

Films

Deposition Temperature Range N/A

0-0-0

1333-74-0

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

GIXRD, Grazing Incidence X-Ray Diffraction

Bruker-Axs D8 Advance diffractometer/reflectometer

Thickness

EDS, EDX, Energy Dispersive X-ray Spectroscopy

Oxford INCA 350 Energy Spectrometer

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

Unknown

Bruker Nonius KappaCCD diffractometer

Conformality, Step Coverage

SEM, Scanning Electron Microscopy

Hitachi S-4800 Field Emission Scanning Electron Microscope

Resistivity, Sheet Resistance

Four-point Probe

Alessi C4S Four Point Probe

Precursor Characterization

TGA, Thermo Gravimetric Analysis

Unknown

Substrates

Glass

Silicon

Keywords

Silver

Notes

Plasma source limitations require it to be kept on during the entire run with slow power ramping between high and low powers.

Portion of the reactor was replaced by polycarbonate to be compatible with the plasma source.

Used Sairem SURF451 surfatron plasma source.

83

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