Publication Information

Title:
Interface Properties of Nickel-silicide Films Deposited by Using Plasma-assisted Atomic Layer Deposition
Type:
Journal
Info:
Journal of the Korean Physical Society, Vol. 55, No. 3, pp. 1153 - 1157
Date:
2009-01-17

Author Information

Name Institution
Kwang-Man LeeJeju National University
Chang Young KimJeju National University
Chi Kyu ChoiJeju National University
Sang-Won YunKyungpook National University
Jong-Bong HaKyungpook National University
Jung-Hee LeeKyungpook National University
Jeong Yong LeeKorea Advanced Institute of Science and Technology

Films

Plasma Ni


Film/Plasma Properties

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction

Characteristic: Compositional Depth Profiling
Analysis: AES, Auger Electron Spectroscopy

Characteristic: Microstructure
Analysis: TEM, Transmission Electron Microscope

Characteristic: Resistivity, Sheet Resistance
Analysis: Four-point Probe

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: Electron Diffraction

Substrates

Si(100)

Keywords

Silicide

Notes

Unspecified "Bis-Ni precursor"
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