Atomic hydrogen-assisted ALE of germanium
Type:
Journal
Info:
Applied Surface Science 90 (1995) 349-356
Date:
1995-05-30
Author Information
| Name | Institution |
|---|---|
| Satoshi Sugahara | Tokyo Institute of Technology |
| Masaru Kadoshima | Tokyo Institute of Technology |
| Takuya Kitamura | Tokyo Institute of Technology |
| Shigeru Imai | Tokyo Institute of Technology |
| Masakiyo Matsumura | Tokyo Institute of Technology |
Films
Plasma Ge
Film/Plasma Properties
Characteristic: Thickness
Analysis: Profilometry
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: RHEED, Reflection High-Energy Electron Diffraction
Characteristic: Morphology, Roughness, Topography
Analysis: SEM, Scanning Electron Microscopy
Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Characteristic: Chemical Composition, Impurities
Analysis: AES, Auger Electron Spectroscopy
Substrates
| Ge |
Notes
| 1577 |