Atomic hydrogen-assisted ALE of germanium

Type:
Journal
Info:
Applied Surface Science 90 (1995) 349-356
Date:
1995-05-30

Author Information

Name Institution
Satoshi SugaharaTokyo Institute of Technology
Masaru KadoshimaTokyo Institute of Technology
Takuya KitamuraTokyo Institute of Technology
Shigeru ImaiTokyo Institute of Technology
Masakiyo MatsumuraTokyo Institute of Technology

Films

Plasma Ge


Film/Plasma Properties

Characteristic: Thickness
Analysis: Profilometry

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: RHEED, Reflection High-Energy Electron Diffraction

Characteristic: Morphology, Roughness, Topography
Analysis: SEM, Scanning Electron Microscopy

Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy

Characteristic: Chemical Composition, Impurities
Analysis: AES, Auger Electron Spectroscopy

Substrates

Ge

Notes

1577