Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

Contact us for more information.


DMG, Dimethylgermane, Me2GeH2, CAS# 1449-64-5

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 3 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Atomic layer epitaxy of germanium
2Atomic hydrogen-assisted ALE of germanium
3Hydrogen-induced abstraction mechanism of surface methyl groups in atomic-layer-epitaxy of germanium