Atomic layer epitaxy of germanium

Type:
Journal
Info:
Applied Surface Science 82-83 (1994) 380-386
Date:
1994-06-30

Author Information

Name Institution
Satoshi SugaharaTokyo Institute of Technology
Takuya KitamuraTokyo Institute of Technology
Toshinori ImaiTokyo Institute of Technology
Masakiyo MatsumuraTokyo Institute of Technology

Films

Plasma Ge


Film/Plasma Properties

Characteristic: Thickness
Analysis: Profilometry

Substrates

Ge
SiO2

Keywords

Notes

1600