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Publication Information

Title: Hot-wire-assisted atomic layer deposition of a high quality cobalt film using cobaltocene: Elementary reaction analysis on NHx radical formation

Type: Journal

Info: Journal of Vacuum Science & Technology A 30, 01A144 (2012)

Date: 2011-10-31

DOI: http://dx.doi.org/10.1116/1.3666034

Author Information

Name

Institution

Taiyo Nippon Sanso Corporation

Taiyo Nippon Sanso Corporation

University of Tokyo

University of Tokyo

University of Tokyo

Films

Other Co using Custom Hot-wire

Deposition Temperature Range = 100-350C

1277-43-6

7664-41-7

Thermal Co using Custom Hot-wire

Deposition Temperature Range = 100-350C

1277-43-6

7664-41-7

Other Co using Custom Hot-wire

Deposition Temperature Range = 100-350C

1277-43-6

7727-37-9

1333-74-0

Other Co using Custom Hot-wire

Deposition Temperature Range = 100-350C

1277-43-6

1333-74-0

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Conformality, Step Coverage

SEM, Scanning Electron Microscopy

JEOL JSM-6340F

Gas Phase Species

QMS, Quadrupole Mass Spectrometer

Unknown

Thickness

SEM, Scanning Electron Microscopy

JEOL JSM-6340F

Chemical Composition, Impurities

XPS, X-ray Photoelectron Spectroscopy

Unknown

Substrates

Keywords

Modeling

Reaction Kinetics

Reaction Mechanism

Notes

Thermal NH3, hot-wire 25% N2/75% H2, and hot-wire 100% H2 resulted in no deposition.

650



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