
Hot-wire-assisted atomic layer deposition of a high quality cobalt film using cobaltocene: Elementary reaction analysis on NHx radical formation
Type:
Journal
Info:
Journal of Vacuum Science & Technology A 30, 01A144 (2012)
Date:
2011-10-31
Author Information
Name | Institution |
---|---|
Hideharu Shimizu | Taiyo Nippon Sanso Corporation |
Kaoru Sakoda | Taiyo Nippon Sanso Corporation |
Takeshi Momose | University of Tokyo |
Mitsuo Koshi | University of Tokyo |
Yukihiro Shimogaki | University of Tokyo |
Films
Other Co
Thermal Co
Other Co
Other Co
Film/Plasma Properties
Characteristic: Conformality, Step Coverage
Analysis: SEM, Scanning Electron Microscopy
Characteristic: Gas Phase Species
Analysis: QMS, Quadrupole Mass Spectrometer
Characteristic: Thickness
Analysis: SEM, Scanning Electron Microscopy
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Substrates
Keywords
Modeling |
Reaction Kinetics |
Reaction Mechanism |
Notes
Thermal NH3, hot-wire 25% N2/75% H2, and hot-wire 100% H2 resulted in no deposition. |
650 |