Publication Information

Title:
Hot-wire-assisted atomic layer deposition of a high quality cobalt film using cobaltocene: Elementary reaction analysis on NHx radical formation
Type:
Journal
Info:
Journal of Vacuum Science & Technology A 30, 01A144 (2012)
Date:
2011-10-31

Author Information

Name Institution
Hideharu ShimizuTaiyo Nippon Sanso Corporation
Kaoru SakodaTaiyo Nippon Sanso Corporation
Takeshi MomoseUniversity of Tokyo
Mitsuo KoshiUniversity of Tokyo
Yukihiro ShimogakiUniversity of Tokyo

Films

Other Co


Thermal Co


Other Co


Other Co


Film/Plasma Properties

Characteristic: Conformality, Step Coverage
Analysis: SEM, Scanning Electron Microscopy

Characteristic: Gas Phase Species
Analysis: QMS, Quadrupole Mass Spectrometer

Characteristic: Thickness
Analysis: SEM, Scanning Electron Microscopy

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Substrates

Keywords

Modeling
Reaction Kinetics
Reaction Mechanism

Notes

Thermal NH3, hot-wire 25% N2/75% H2, and hot-wire 100% H2 resulted in no deposition.
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