Publication Information

Title:
PEALD-Grown Crystalline AlN Films on Si(100) with Sharp Interface and Good Uniformity
Type:
Journal
Info:
Nanoscale Research Letters (2017) 12:279
Date:
2017-04-05

Author Information

Name Institution
Sanjie LiuUniversity of Science and Technology
Mingzeng PengUniversity of Science and Technology
Caixia HouUniversity of Science and Technology
Yingfeng HeUniversity of Science and Technology
Meiling LiUniversity of Science and Technology
Xinhe ZhengUniversity of Science and Technology

Films

Plasma AlN


Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Refractive Index
Analysis: Ellipsometry

Characteristic: Extinction Coefficient
Analysis: Ellipsometry

Characteristic: Interfacial Layer
Analysis: XRR, X-Ray Reflectivity

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: GIXRD, Grazing Incidence X-Ray Diffraction

Characteristic: Thickness
Analysis: TEM, Transmission Electron Microscope

Characteristic: Uniformity
Analysis: TEM, Transmission Electron Microscope

Characteristic: Interfacial Layer
Analysis: TEM, Transmission Electron Microscope

Substrates

Si(100)

Keywords

Notes

1003