Your search for plasma enhanced atomic layer deposition publications using Angstrom-dep III PEALD hardware returned 2 records. If there are too many results, you may want to use the multi-factor search to narrow the results.
|1||Metallic indium segregation control of InN thin films grown on Si(100) by plasma-enhanced atomic layer deposition|
|2||PEALD-Grown Crystalline AlN Films on Si(100) with Sharp Interface and Good Uniformity|
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