Growth and characterization of aluminum oxide films by plasma-assisted atomic layer deposition
Type:
Journal
Info:
Materials Science and Engineering C 16 2001 59-64
Date:
2001-10-08
Author Information
| Name | Institution |
|---|---|
| Chang-Wook Jeong | Seoul National University |
| Byung-il Lee | Seoul National University |
| Seung-Ki Joo | Seoul National University |
Films
Film/Plasma Properties
Characteristic: Chemical Composition, Impurities
Analysis: SIMS, Secondary Ion Mass Spectrometry
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: Refractive Index
Analysis: Ellipsometry
Characteristic: Leakage Current
Analysis: I-V, Current-Voltage Measurements
Substrates
| Silicon |
| SiO2 |
| Co |
Notes
| 1699 |