The publication database currently has 1692 entries.
Use Advanced Search for more complex searches
Recent Database Additions
Ferroelectricity of HfxZr1-xO2 thin films fabricated by 300°C low temperature process with plasma-enhanced atomic layer deposition
Hydrogen-induced abstraction mechanism of surface methyl groups in atomic-layer-epitaxy of germanium
Hydrogen-plasma-assisted hybrid atomic layer deposition of Ir thin film as novel Cu diffusion barrier
Self-limiting diamond growth from alternating CFx and H fluxes
Sub-10-nm ferroelectric Gd-doped HfO2 layers
Self-limiting diamond growth from alternating CFx and H fluxes
Type:
Journal
Info:
Diamond and Related Materials 7 (1998) 1087-1094
Date:
1997-12-10
Author Information
| Name | Institution |
|---|---|
| S.F. Komarov | Rensselaer Polytechnic Institute (RPI) |
| J.-J. Lee | Rensselaer Polytechnic Institute (RPI) |
| J.B. Hudson | Rensselaer Polytechnic Institute (RPI) |
| M.P. D'Evelyn | Rensselaer Polytechnic Institute (RPI) |
Films
Plasma Diamond
Film/Plasma Properties
Characteristic: Thickness
Analysis: SEM, Scanning Electron Microscopy
Characteristic: Images
Analysis: SEM, Scanning Electron Microscopy
Substrates
| Mo |
| Diamond |
Keywords
Notes
| 1689 |